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Modeling Chemical Vapor Atomic Layer Deposition with the Amsterdam Modeling Suite | AMS
Автор: AmsterdamDensityFunctional
Загружено: 2025-10-31
Просмотров: 162
Описание:
Discover how to simulate atomic-scale chemical vapor deposition (CVD) and atomic layer deposition (ALD) with precision. Using the Amsterdam Modeling Suite, watch layer-by-layer alumina growth on a germanium surface, explore reactive dynamics with ReaxFF, and understand how process conditions affect film properties—all before entering the lab.
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