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How To Spin Coat Resist
Автор: NTNU NanoLab
Загружено: 2018-03-02
Просмотров: 18001
Описание:
This video demonstrates how spin coating of resist can be performed at NTNU NanoLab.
NTNU NanoLab Users can find more information at: http://forum.nano.ntnu.no/t/how-to-sp...
*Dispensing resist*
The volume of resist needed to coat depends on the viscosity and final thickness of the resist. Typically no more than 0.5 mL of resist is needed to coat a 2-inch wafer.
*Cleaning instructions*
Photoresist spinner: Ethanol
EBL spinner: Ethanol for most resist, acetone for CSAR62
SU-8 and mr-DWL spinner: Acetone
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