Huawei CEO: "This NEW EUV Lithography Machine Will Destroy ASML!"
Автор: ChipScope
Загружено: 2026-01-08
Просмотров: 377
Chinese researchers from the Chinese Academy of Sciences have developed an extreme ultraviolet light source platform that operates at internationally competitive parameters, marking a significant development in semiconductor manufacturing. The breakthrough comes amid intensified US export controls aimed at restricting China’s access to advanced chipmaking technology, including EUV lithography systems that are essential for producing semiconductors below the 7-nanometer node and have been exclusively supplied by ASML.
Alongside this development, Huawei has advanced its domestic semiconductor capabilities with the Ascend 910C AI chip, designed to offer performance comparable to restricted Nvidia products despite manufacturing challenges. These developments have raised concerns for global semiconductor suppliers, reshaped expectations for China’s technological self-sufficiency, and highlighted potential shifts in the global semiconductor supply chain as sanctions, market access limitations, and indigenous innovation continue to redefine industry dynamics.
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