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Comparison of Al2O3 & HfO2 MOSCAP III-V/Si power splitters & (de)interleavers for DWDM optical links
Автор: Stan Cheung
Загружено: 2022-06-06
Просмотров: 40
Описание:
We compare III-V/Si MZIs and (de-)interleavers using Al2O3- and HfO2-based MOSCAP structures as phase tuners. HfO2 twice as thick as Al2O3 exhibited lower VπL. We demonstrate crosstalk improvement of ring-assisted (de-)interleavers with both structures.
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