Chipmetrics Webinar - Computational modeling of AS ALD From Fundamentals to design strategies
Автор: Chipmetrics
Загружено: 2025-11-27
Просмотров: 43
In this webinar, Prof. Dr. Ralf Tonner-Zech from Leipzig University provides a deep dive into computational modelling approaches for Atomic Layer Deposition (ALD) and Area-Selective ALD. This session covers fundamental principles, real-life process challenges, modelling methods, and strategies for chemical design and process optimization at the atomic scale.
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