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Structuring and Uniformity Improvement of Thin Film Waveguide Materials

Автор: scia Systems

Загружено: 2025-12-09

Просмотров: 59

Описание:

Thin-film waveguides, widely acclaimed for their electro-optic and piezoelectric properties, demand precise fabrication techniques to ensure consistent device performance. Integrating new materials, e.g. Lithium Niobate and Silicon Nitride, material stacks, and designs is essential in advancing photonics and optoelectronics, but it also requires new etching solutions. Ion beam technologies are versatile tools that meet the challenges of waveguide processing.

In his presentation, Matthias Nestler, Product Development Director at scia Systems, covers specific applications in nanodevice and thin-film manufacturing:
High-precision ion beam patterning
Ion beam trimming for film thickness correction
Generation of 3D nanostructures

Do you want to know more or speak to one of our experts? Contact us: https://www.scia-systems.com/contact/...


About scia Systems
Founded in 2013, scia Systems is a technology leader in thin-film process equipment based on advanced ion beam and plasma technologies. The systems are used for coating, etching, and cleaning processes with nanometer-resolution and have been successfully implemented in various high-tech industries worldwide, including microelectronics, MEMS, and precision optics industries. For more information, visit the company’s website at www.scia-systems.com.

Structuring and Uniformity Improvement of Thin Film Waveguide Materials

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